Oddelenie environmentálnej fyziky - Prihlásený: veronika
Katedra astronómie, fyziky Zeme a meteorológie, FMFI UK, Bratislava,

Effect of chemical reaction stoichiometry on the pressure variation in the etch chamber during etching of aluminium

Martišovitš V., Zahoran M., Košinár I., Trnovec J.
Physics Letters A 173 (6), 462 (1993)

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Citácie:

1.)	Beale, D. - Siu, S. - Patrick, R. : In: Trends in aluminum etch rate uniformity in a commercial inductively coupled plasma etch system. Journal of Vacuum Science & Technology B, Vol. 16, No. 3, 1998. s. 1059-1067 - SCI (1998) -------------