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Faculty of Mathematics, Physics and Informatics, Comenius University Bratislava

In situ monitoring of plasma etching and deposition by using the gas pressure difference

Trnovec J., Martišovitš V., Košinár I., Juráni R.
12th International Symposium on Plasma Chemistry, Mineapolis, USA, August 21-25, p. 379-384 (1995)

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Abstract:

Citations:

1.)	Mozetic, M. - Drobnic, M. : Vacuum, Vol. 50, 1998, No. 3-4,. p. 319-322 - SCI (1998) -------------